The ‘recycling trap’: a generalized explanation of discharge runaway in high-power impulse magnetron sputtering

Publication Type

Journal Article

Date Published

01/2012

Abstract

Contrary to paradigm, magnetron discharge runaway cannot always be related to self-sputtering. We report here that the high density discharge can be observed with all conducting targets, including low sputter yield materials such as carbon. Runaway to a high density discharge is therefore generally based on self-sputtering in conjunction with the recycling of gas atoms in the magnetic field-affected pre-sheath. A generalized runaway condition can be formulated, offering a pathway to a time-dependent model for high-power impulse magnetron sputtering that includes rarefaction and an explanation for the termination of runaway.

Journal

Journal of Physics D: Applied Physics

Volume

45

Year of Publication

2012

Short Title

J. Phys. D: Appl. Phys.

Issue

1

Pagination

012003

ISSN

0022-3727