Publications

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Anders, André, and Simone Anders. "Working Principle of the Hollow-Anode Plasma Source." Plasma Source Science and Technology 4.4 (1995) 571-575. LBL-36240.
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Anders, André, and Othon R Monteiro. "Surface Engineering of Glazing Materials and Structures Using Plasma Processes." Glass Processing Days 2003 . Tampere, Finland, 2003. LBNL-52436.
Ni, Pavel A, and André Anders. "Supersonic metal plasma impact on a surface: an optical investigation of the pre-surface region." Journal of Physics D: Applied Physics 43.13 (2010). LBNL-2982E.
Field, Matthew R, Dougal G McCulloch, Sunnie HN Lim, André Anders, Vicki J Keast, and R.W. Burgess. "The structure and electron energy loss near edge structure of tungsten oxide thin films prepared by pulsed cathodic arc deposition and plasma-assisted pulsed magnetron sputtering." Journal of Physics: Condensed Matter 20 (2008) 175216. LBNL-580E.
Mohamed, Sodky H, and André Anders. "Structural, optical and electrical properties of WOxNy films deposited by reactive dual magnetron sputtering." Surface and Coatings Technology 201.6 (2006) 2977-2983. LBNL-59900.
Andersson, Joakim, Pavel A Ni, and André Anders. "Spectroscopic imaging of self-organization in high power impulse magnetron sputtering plasmas." Applied Physics Letters 103.5 (2013) 054104.
Horwat, David, and André Anders. "Spatial distribution of average charge state and deposition rate in high power impulse magnetron sputtering of copper." Journal of Physics D 41 (2008) 135210-1-6. LBNL-679E.
Anders, André, Eungsun Byon, Dong-Ho Kim, Kentaro Fukuda, and Sunnie HN Lim. "Smoothing of ultrathin silver films by transition metal seeding." Applied Physics Letters (2006). LBNL-59621.
Anders, André. "Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions." Applied Physics Letters 92.20 (2008). LBNL-171E.
Andersson, Joakim, and André Anders. "Self-sputtering far above the runaway threshold: an extraordinary metal ion generator." Physical Review Letters (2008). LBNL-1641E.
Anders, André. "Self-organization and self-limitation in high power impulse magnetron sputtering." Applied Physics Letters 100.22 (2012). LBNL-5685E.
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Leung, Michael SH, Ralf Klockenbrink, Christian F Kisielowski, Hiroaki Fujii, Joachim Krüger, Sudhir G Subramanya, André Anders, Zuzanna Liliental-Weber, Michael D Rubin, and Eicke R Weber. "Pressure Controlled GaN MBE Growth Using a Hollow Anode Nitrogen Ion Source." Ed. Krüger, Joachim. Materials Research Society Proceedings 449.221 (1997). LBNL-39851.
Anders, André, and T. Schulke. "Predicting Ion Charge State Distributions of Vacuum Arc Plasmas." 1996. LBL-37921.
Pelletier, Jacques, and André Anders. "Plasma-Based Ion Implantation and Deposition: A Review of Physics, Technology, and Applications." IEEE Transactions on Plasma Science 33 (2005) 1944-1959. LBNL-57610.
Anders, André, and Jeff Brown. "A Plasma Lens for Magnetron Sputtering." IEEE Transactions on Plasma Science 39.11 (2011) 2528 - 2529.
Anders, André, Nitisak Pasaja, Sunnie HN Lim, Tim C Petersen, and Vicki J Keast. "Plasma biasing to control the growth conditions of diamond-like carbon." Surface and Coatings Technology 201.8 (2006) 4628-4632. LBNL-59023.
Anders, André. "Plasma and Ion Sources in Large Area Coatings: A Review." 2005. LBNL-57127.
Anders, André. "Plasma and Ion Assistance in Physical Vapor Deposition: A Historical Perspective." 50th Technical Annual Meeting of the Society of Vacuum Coaters. 2007. LBNL-61903.
Anders, André, Joakim Andersson, David Horwat, and Arutiun P Ehiasarian. "Physics of High Power Impulse Magnetron Sputtering." ISSP2007: The 9th International Symposium on Sputtering & Plasma Processes. 2007. LBNL-62147.
Anders, André. "Physics of Arcing, and Implications to Sputter Deposition." Thin Solid Films (2005). LBNL-54220 .
Anders, André. "Physics of Arcing, and Implications to Sputter Deposition." International Conference on Coatings on Glass. Saarbrucken, Germany, 2003. LBNL-54220.
Mohamed, Sodky H, and André Anders. "Physical properties of erbium implanted tungsten oxide films deposited by reactive dual magnetron sputtering." Thin Solid Films 515.13 (2007) 5264-5269. LBNL-62248.

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